2021 Equipment

NanoFrazor Mix & Match (Heidelberg Instruments) is the first system of its kind installed in Spain, providing a unique platform for direct-write micro- and nanolithography. It combines high-resolution Thermal Scanning Probe Lithography (t-SPL) with Direct Laser Sublimation (DLS), allowing nano- and microstructures to be patterned within the same fabrication workflow. Its heated probe enables nanoscale writing, in-situ imaging and metrology, while laser writing provides rapid fabrication of larger structures, making the system particularly suited for advanced nanoelectronics, photonics and quantum devices.

The equipment includes a dedicated resist spinner and a hot-plate to deposit and cure the resists. The spinner is can hold 150 mm diameter wafers. The hot plate can hold wafers up to 200 mm in diameter, with temperature control from 60 to 250 °C.