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Device fabrication

  • Nanofrazor (Heidelberg Inst.)
  • Nanolithography (Crestec CABL9500C/Res:10nm)
  • Photolithography (SUSS MJB4/Res:500nm)
  • ICP System (Oxford Plasmalab µ80)
  • RIE System
  • O2 Plasma Etcher
  • Wet Etching
  • Metal Evaporators (Joule/e-beam)
  • Thermal and Rapid Thermal Annealers
  • Convention Oven
  • Polisher (Struers LaboPol-4)
  • Diamond Saw
  • Semiautomatic Microsoldering System (TPT HB100)